Axcelis Optima HD(tm) High Dose Implanter Approved as Tool of Record At SMIC

Productivity and Process Advantages Key Factors in Success


BEVERLY, Mass., July 22, 2009 (GLOBE NEWSWIRE) -- Axcelis Technologies, Inc. (Nasdaq:ACLS) has announced today that Semiconductor Manufacturing International Corporation (SMIC), a leading foundry based in China, has made its single wafer Optima HD(tm) high dose implant system process tool of record for advanced logic production. The Optima HD addresses both traditional high dose implants as well as an expanding range of applications, including molecular and hydrogen implants.

"We're very pleased that the addition of the Optima HD high dose implanter further strengthens our relationship with SMIC," said Mary Puma, chairman and CEO of Axcelis. "The Optima HD has demonstrated its exceptional process capabilities as well as met the exacting demands of advanced foundry process flows."

The Optima HD covers all traditional and emerging high dose applications providing significant throughput advantages. The Optima HD delivers precise, repeatable implants using Axcelis' advanced spot beam technology. In addition, the Optima HD's proprietary RadiusScan(tm) endstation enables the system to cover an extremely broad dose range for optimized flexibility.

About Axcelis

Axcelis Technologies, Inc. (Nasdaq:ACLS) headquartered in Beverly, Massachusetts, provides innovative, high-productivity solutions for the semiconductor industry. Axcelis is dedicated to developing enabling process applications through the design, manufacture and complete life support of ion implantation and cleaning systems. The company's Internet address is: www.axcelis.com.



            

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