Nanolab Technologies Expands Services With New Analytical and Surface Measurement Tools

MILPITAS, CA--(Marketwired - Mar 27, 2014) - As its business increases, Nanolab Technologies, a Silicon Valley-based analytical services lab, has purchased and installed new tools and moved to a seven-day workweek. Both DSIMS and profilometer instruments were added to the 48,000 square foot advanced laboratory. To keep up with the demand for quick turnaround services, the company has moved to a continuous operations service model for uninterrupted delivery of critical work.

Dynamic Secondary Ion Mass Spectrometry (SIMS) uses a continuous, focused beam of primary ions to remove material from the surface of a sample by sputtering. Dynamic SIMS is extremely sensitive -- able to detect fractions in the range of parts per billion -- and is used to determine the elemental composition and levels of trace impurities and dopants in solid materials. Profilometry is used for inspection, surface measurement and imaging of substrates and works as a complement to the DSIMS tool.

"The new tools for Dynamic SIMS and profilometry," commented John Traub, President and CEO, "continues the path we established in 2007 to accelerate growth and capacity in leading-edge instrumentation and facilities. Moving to a seven-day workweek cements our commitment to service and means our customers will not pay extra fees for expedited work through the weekends. Both announcements mean new, better and quicker services for our customers."

About Nanolab Technologies
Nanolab Technologies provides knowledge-based analytical services for advanced microscopy, chemical analysis, electrical failure analysis, materials analysis, FIB circuit edit, and defect analysis to the semiconductor, solar, MEMS, LED, medical device and other high technologies industries. A private, employee-owned company, Nanolab Technologies designed and occupies a 48,000 square foot, advanced laboratory in Silicon Valley to maximize the performance of leading-edge Extreme High Spatial Resolution instruments to meet the requirements of current and future technology nodes. A second facility is located at the College of Nanoscale Science and Engineering (CNSE) at the University of Albany. www.nanolabtechnologies.com