RENO, Nev., Oct. 7, 2003 (PRIMEZONE) -- Altair Nanotechnologies, Inc. (Nasdaq:ALTI) announced today that Jan Prochazka, Altair's Senior Research Scientist, will be presenting at the Electrochemical Society Meeting in Orlando, Florida, October 12 - 16, 2003.
Prochazka will present a poster titled "Manufacturing of Nano-sized Ceramic Materials Using 'Altair Thin Film' Industrial Process" on October 14, 2003, in Symposium A2, Nano Structured Materials. Prochazka's poster focuses on the flexibility of Altair's proprietary process to produce a variety of materials that exhibit a range of unique properties.
The presentation describes the industrial scale-up of nano-materials manufacturing capabilities and demonstrates the flexibility of the Altair proprietary thin film technology, the control of chemical composition, doping, crystal phase purity, particle size, morphology, sintering and other properties of nano products made by Altair's novel process.
The fundamental principles of 'nano-scale' diffusion, sintering properties and impact of morphology of nanoparticles will be demonstrated in practical examples of Altair's nanotechnology used in commercial applications. These applications include lithium ion electrode grade battery materials, thermal coatings, solid oxide fuel cells and photocatalytic activity of Altair's nano-based products.
Dr. Dirk Verhulst, Engineering Manager of Altair's nanomaterials subsidiary, has recently presented two significant papers. In September, Dr. Verhulst presented a paper titled "A New Process for the Production of Nano-Sized TiO2 and Other Ceramic Compounds in Thin Film" at the 2003 International Conference on Nanotechnology and Powder Metallurgy in Providence, Rhode Island. This paper describes Altair's novel nanomaterials technology, which separates Altair from other nanomaterials manufacturers. The paper highlighted the ability of Altair's proprietary process to control chemical composition, morphology, particle size, and particle size distribution.
In August, Dr. Verhulst presented a paper titled "New Developments in the Altair Hydrochloride TiO2 Pigment Process" at the 2003 International Symposium on Hydrometallurgy, organized by The Metallurgical Society (TMS), the Canadian Institute of Mining and Metallurgy (CIMM) and the Society for Mining, Metallurgy and Exploration (SME). Dr. Verhulst described recent advances in understanding the behavior of impurities in the Altair Hydrochloride Pigment Process (AHPP) and in pigmentary particle size TiO2 rutile formation. These key technology discoveries strengthen the environmental and low-cost advantages of the AHPP over existing chloride and sulfate processes.
Altair Nanotechnologies, Inc.
Nanotechnology is rapidly emerging as a unique industry sector. Altair Nanotechnologies is positioning itself through product innovation within this emerging industry to become a leading supplier of nanomaterial technology and nanomaterials worldwide. Altair owns a proprietary technology for making nanocrystalline materials of unique quality both economically and in large quantities. The company is currently developing special materials with potential applications in pharmaceuticals, titanium pigment and metal, batteries, fuel cells, solar cells, advanced energy storage devices, thermal spray coatings, catalysts, cosmetics and environmental remediation. For additional information on Altair and its nanoparticle materials, visit www.altairnano.com.
Forward-Looking Statements
This release may contain forward-looking statements as well as historical information. Forward-looking statements, which are included in accordance with the "safe harbor" provisions of the Private Securities Litigation Reform Act of 1995, may involve risks, uncertainties and other factors that may cause the company's actual results and performance in future periods to be materially different from any future results or performance suggested by the forward-looking statements in this release. These risks and uncertainties include, without limitation, that the company may not be able to obtain the capital to fund its operations in 2004 or otherwise, and that because of the lack of funding or other reasons, the company may be unable to fully exploit its technologies in a manner that they begin generating significant revenue.
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