-- Low residual stress featuring an ultra low modulus, which produces a "rubbery" consistency to the film and results in minimal wafer bow, particularly important with 300mm wafers that are hard to process if the wafers are not flat. -- Low temperature cure: many device types, for example, can fail if processed above 200° C. -- Good adhesion: Shin-Etsu proprietary adhesion promoters are built in to ensure good bonding. -- Low dielectric constant for superior electrical performance.Shin-Etsu Chemical developed the siloxane-based SINR series photoresist from their long tradition of working with silicone materials. Shin-Etsu has tailored the materials to specific, custom applications. Through-Silicon Vias (TSV) For TSV applications, these films can be applied with a roll laminator or by vacuum lamination, which is preferred for TSV because the combination of temperature, pressure and vacuum allows the material to flow into the vias, producing a void-free dielectric fill and a planarized surface. CMOS image sensors are the first process that now uses this TSV technology. TSVs can typically feature vias that are 50 to 100 microns across. CMOS Image Sensors: Shin-Etsu MicroSi SINR works well for bonding applications including:
-- Wafer-to-wafer -- Chip-to-wafer -- Wafer-to-glass, as in CMOS image sensorsThe SINR 3170 series and SINR 3570 series are now in production and available for sampling and evaluation by contacting Shin-Etsu MicroSi. About Shin-Etsu Shin-Etsu Chemical Co., Ltd., the Tokyo-based chemical company, is the world's largest supplier of semiconductor materials, semiconductor silicon, PVC resin, synthetic quartz glass and methylcellulose and is a major producer of materials including silicones and rare earth magnets. Shin-Etsu Chemical's stock (
Contact Information: Contacts Shin-Etsu MicroSi, Inc. Ed Nichols (480) 893.8898 x106 Agency: Bruce Kirkpatrick Kirkpatrick Communications (925) 244-9100